Lithographic apparatus, device manufacturing method and...

Details Lithographic apparatus, device manufacturing method and... Lithographic apparatus, device manufacturing method and...

2007-01-23

2007-01-23

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S075000

Reexamination Certificate

active

10944429

ABSTRACT:
The present invention relates to a lithographic apparatus including an illumination system configured to condition a beam of radiation, a support structure configured to support a patterning device, the patterning device configured to pattern the beam of radiation, a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a robot configured to exchange the exchangeable object. The robot includes a base part and a movable part, the movable part being moveably connected to the base part and including an object handler configured to handle the exchangeable object. The apparatus further includes an object detector configured to detect the exchangeable object in the object handler, the object detector including a transmitter configured to transmit a signal and a receiver configured to receive a signal, the transmitter and the receiver being positioned separately from the movable part of the robot.

REFERENCES:
patent: 3543947 (1970-12-01), Devol
patent: 5570992 (1996-11-01), Lemelson
patent: 5895923 (1999-04-01), Blake
patent: 5905850 (1999-05-01), Kaveh
patent: 2003/0045205 (2003-03-01), Herb et al.
patent: 2004/0201231 (2004-10-01), Stacey

Affiliated with

Also associated with

Rating

Lithographic apparatus, device manufacturing method and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus, device manufacturing method and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus, device manufacturing method and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3803332