Lithographic apparatus, device manufacturing method and...

Details Lithographic apparatus, device manufacturing method and... Lithographic apparatus, device manufacturing method and...

2008-01-01

2008-01-01

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000, C378S034000

Reexamination Certificate

active

07315351

ABSTRACT:
The invention relates to a lithographic apparatus and a device manufacturing method. The lithographic apparatus is of the scanning type, in which a radiation beam effectively scans across a surface of a substrate. The apparatus comprises a beam attenuator, e.g. in the form of a filter, having an attenuation value profile that varies as a function of position along the scanning direction. Appropriate selection of the attenuation value profile allows the illumination of the substrate to be more homogeneous, since e.g. received dose effects due to pulse to pulse variations in a pulsed illumination source are much better averaged out.

REFERENCES:
patent: 4928008 (1990-05-01), Huggins et al.
patent: 6404499 (2002-06-01), Stoeldraijer et al.
patent: 6455862 (2002-09-01), van der Veen et al.
patent: 6583855 (2003-06-01), Krikke et al.
patent: 2004/0090607 (2004-05-01), Yoshida

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