Lithographic apparatus, device manufacturing method and...

Photocopying – Projection printing and copying cameras – Detailed holder for photosensitive paper

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000

Reexamination Certificate

active

07030967

ABSTRACT:
A substrate holder has burls having a height not less than 100 μm and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the substrate. Thereby concave wafers can be reliably clamped by generating an initial vacuum in a central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen until the wafer is fully clamped.

REFERENCES:
patent: 5923408 (1999-07-01), Takabayashi
patent: 6232615 (2001-05-01), Van Empel
patent: 6257564 (2001-07-01), Avneri et al.
patent: 6307620 (2001-10-01), Takabayashi et al.
patent: 6762826 (2004-07-01), Tsukamoto et al.
patent: 6799940 (2004-10-01), Joe et al.
patent: 2001/0001953 (2001-05-01), Griffiths et al.
patent: 0 803 904 (1997-10-01), None
patent: 0 803 904 (1997-10-01), None
patent: 0 947 884 (1999-10-01), None
patent: 0 947 884 (1999-10-01), None
patent: 2 149 697 (1985-06-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic apparatus, device manufacturing method and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus, device manufacturing method and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus, device manufacturing method and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3576612

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.