Lithographic apparatus, device manufacturing method, and...

Details Lithographic apparatus, device manufacturing method, and... Lithographic apparatus, device manufacturing method, and...

2005-08-02

2005-08-02

Font, Frank G. (Department: 2883)

Radiant energy

Irradiation of objects or material

C250S492200, C250S492220, C250S492300, C250S493100, C250S494100, C250S495100, C250S50400H, C378S034000

Reexamination Certificate

active

06924492

ABSTRACT:
Pre-cleaning or in situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating the optical component with microwave and/or infra-red radiation, preferably infra-red radiation having a wavelength or a range of wavelengths in the range of from 1000 cm−1to 4600 cm−1. This technique may be suitable for cleaning a mask. By monitoring the absorption of microwave and/or infra-red radiation directed at a contaminated optical component, the degree of contamination of said component can be qualified. This method may also be suitable for reducing the partial pressure of water in EUV apparatus.

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Copy of International Search Report dated Jun. 29, 2001, 3 pages.
Copy of European Search Report dated Apr. 10, 2002, Application No. EP 01 31 0709.

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