Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2006-03-13
2011-10-25
Glick, Edward (Department: 2882)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S053000
Reexamination Certificate
active
08045134
ABSTRACT:
An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
REFERENCES:
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3648587 (1972-03-01), Stevens
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4390273 (1983-06-01), Loebach et al.
patent: 4396705 (1983-08-01), Akeyama et al.
patent: 4405701 (1983-09-01), Banks et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5040020 (1991-08-01), Rauschenbach et al.
patent: 5121256 (1992-06-01), Corle et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 5900354 (1999-05-01), Batchelder
patent: 6191429 (2001-02-01), Suwa
patent: 6236634 (2001-05-01), Lee et al.
patent: 6277533 (2001-08-01), Wakamoto et al.
patent: 6600547 (2003-07-01), Watson et al.
patent: 6603130 (2003-08-01), Bisschops et al.
patent: 2002/0020821 (2002-02-01), Van Santen et al.
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0123040 (2003-07-01), Almogy
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0114117 (2004-06-01), Bleeker
patent: 2004/0119954 (2004-06-01), Kawashima et al.
patent: 2004/0125351 (2004-07-01), Krautschik
patent: 2004/0136494 (2004-07-01), Lof et al.
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0211920 (2004-10-01), Derksen et al.
patent: 2004/0239954 (2004-12-01), Bischoff
patent: 2004/0263809 (2004-12-01), Nakano
patent: 2005/0007569 (2005-01-01), Streefkerk et al.
patent: 2005/0018155 (2005-01-01), Cox et al.
patent: 2005/0024609 (2005-02-01), De Smit et al.
patent: 2005/0030497 (2005-02-01), Nakamura
patent: 2005/0046813 (2005-03-01), Streefkerk et al.
patent: 2005/0046934 (2005-03-01), Ho et al.
patent: 2005/0052632 (2005-03-01), Miyajima
patent: 2005/0052642 (2005-03-01), Shibata et al.
patent: 2005/0094116 (2005-05-01), Flagello et al.
patent: 2005/0094125 (2005-05-01), Arai
patent: 2005/0122505 (2005-06-01), Miyajima
patent: 2005/0132914 (2005-06-01), Mulkens et al.
patent: 2005/0134817 (2005-06-01), Nakamura
patent: 2005/0140948 (2005-06-01), Tokita
patent: 2005/0146693 (2005-07-01), Ohsaki
patent: 2005/0146694 (2005-07-01), Tokita
patent: 2005/0151942 (2005-07-01), Kawashima
patent: 2005/0174550 (2005-08-01), Streefkerk et al.
patent: 2005/0179877 (2005-08-01), Mulkens et al.
patent: 2005/0200815 (2005-09-01), Akamatsu
patent: 2005/0213065 (2005-09-01), Kitaoka
patent: 2005/0213066 (2005-09-01), Sumiyoshi
patent: 2005/0219489 (2005-10-01), Nei et al.
patent: 2005/0233081 (2005-10-01), Tokita
patent: 2005/0259234 (2005-11-01), Hirukawa et al.
patent: 2005/0264780 (2005-12-01), Graeupner
patent: 2006/0033892 (2006-02-01), Cadee et al.
patent: 2006/0033898 (2006-02-01), Cadee et al.
patent: 2006/0098179 (2006-05-01), Hirukawa
patent: 2007/0146663 (2007-06-01), Nagasaka
patent: 2007/0153244 (2007-07-01), Zaal et al.
patent: 206 607 (1984-02-01), None
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 242 880 (1987-02-01), None
patent: 0023231 (1981-02-01), None
patent: 0418427 (1991-03-01), None
patent: 1039511 (2000-09-01), None
patent: 2474708 (1981-07-01), None
patent: 58-202448 (1983-11-01), None
patent: 62-065326 (1987-03-01), None
patent: 62-121417 (1987-06-01), None
patent: 63-157419 (1988-06-01), None
patent: 04-305915 (1992-10-01), None
patent: 04-305917 (1992-10-01), None
patent: 06-124873 (1994-05-01), None
patent: 07-132262 (1995-05-01), None
patent: 07-220990 (1995-08-01), None
patent: 10-228661 (1998-08-01), None
patent: 10-255319 (1998-09-01), None
patent: 10-303114 (1998-11-01), None
patent: 10-340846 (1998-12-01), None
patent: 11-176727 (1999-07-01), None
patent: 2000-058436 (2000-02-01), None
patent: 2001-091849 (2001-04-01), None
patent: 2004-193252 (2004-07-01), None
patent: 2005-012201 (2005-01-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 2004/053596 (2004-06-01), None
patent: WO 2004/053950 (2004-06-01), None
patent: WO 2004/053951 (2004-06-01), None
patent: WO 2004/053952 (2004-06-01), None
patent: WO 2004/053953 (2004-06-01), None
patent: WO 2004/053954 (2004-06-01), None
patent: WO 2004/053955 (2004-06-01), None
patent: WO 2004/053956 (2004-06-01), None
patent: WO 2004/053957 (2004-06-01), None
patent: WO 2004/053958 (2004-06-01), None
patent: WO 2004/053959 (2004-06-01), None
patent: WO 2004053955 (2004-06-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057589 (2004-07-01), None
patent: WO 2004/057590 (2004-07-01), None
patent: WO 2004/090577 (2004-10-01), None
patent: WO 2004/090633 (2004-10-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/092830 (2004-10-01), None
patent: WO 2004/092833 (2004-10-01), None
patent: WO 2004/093130 (2004-10-01), None
patent: WO 2004/093159 (2004-10-01), None
patent: WO 2004/093160 (2004-10-01), None
patent: WO 2004/095135 (2004-11-01), None
patent: WO 2004107417 (2004-12-01), None
patent: WO 2005/010611 (2005-02-01), None
patent: 2005/022616 (2005-03-01), None
patent: WO 2005/024517 (2005-03-01), None
patent: WO 2005/071717 (2005-08-01), None
patent: WO 2005/076324 (2005-08-01), None
M. Switkes et al., “Immersion Lithography at 157 nm”, MIT Lincoln Lab, Orlando 2001-1, Dec. 17, 2001.
M. Switkes et al., “Immersion Lithography at 157 nm”, J. Vac. Sci. Technol. B., vol. 19, No. 6, Nov./Dec. 2001, pp. 2353-2356.
M. Switkes et al., “Immersion Lithography: Optics for the 50 nm Node”, 157 Anvers-1, Sep. 4, 2002.
B.J. Lin, “Drivers, Prospects and Challenges for Immersion Lithography”, TSMC, Inc., Sep. 2002.
B.J. Lin, “Proximity Printing Through Liquid”, IBM Technical Disclosure Bulletin, vol. 20, No. 11B, Apr. 1978, p. 4997.
B.J. Lin, “The Paths to Subhalf-Micrometer Optical Lithography”, SPIE vol. 922, Optical/Laser Microlithography (1988), pp. 256-269.
G.W.W. Stevens, “Reduction of Waste Resulting from Mask Defects”, Solid State Technology, Aug. 1978, vol. 21 008, pp. 68-72.
S. Owa et al., “Immersion Lithography; its potential performance and issues”, SPIE Microlithography 2003, 5040-186, Feb. 27, 2003.
S. Owa et al., “Advantage and Feasibility of Immersion Lithography”, Proc. SPIE 5040 (2003).
Nikon Precision Europe GmbH, “Investor Relations—Nikon's Real Solutions”, May 15, 2003.
H. Kawata et al., “Optical Projection Lithography using Lenses with Numerical Apertures Greater than Unity”, Microelectronic Engineering 9 (1989), pp. 31-36.
J.A. Hoffnagle et al., “Liquid Immersion Deep-Ultraviolet Interferometric Lithography”, J. Vac. Sci. Technol. B., vol. 17, No. 6, Nov./Dec. 1999, pp. 3306-3309.
B.W. Smith et al., “Immersion Optical Lithography at 193nm”, FUTURE FAB International, vol. 15, Jul. 11, 2003.
H. Kawata et al., “Fabrication of 0.2 μm Fine Patterns Using Optical Projection Lithography with an Oil Immersion Lens”, Jpn. J. Appl. Phys. vol. 31 (1992), pp. 4174-4177.
G. Owen et al., “1/8 μm Optical Lithography”, J. Vac. Sci. Technol. B., vol. 10, No. 6, Nov./Dec. 1992, pp. 3032-3036.
H. Hogan, “New Semiconductor Lithography Makes a Splash”, Photonics Spectra, Photonics TechnologyWorld, Oct. 2003 Edition, pp. 1-3.
S. Owa and N. Nagasaka, “Potential Performance and Feasibility of Immersion Lithography”, NGL Workshop 2003, Jul. 10, 2003, Slide Nos. 1-33.
S. Owa et al.,
Jacobs Johannes Henricus Wilhelmus
Lallemant Nicolas Alban
Uitterdijk Tammo
Van De Kerkhof Marcus Adrianus
Asfaw Mesfin T
ASML Netherlands B.V.
Glick Edward
Pillsbury Winthrop Shaw & Pittman LLP
LandOfFree
Lithographic apparatus, control system and device... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic apparatus, control system and device..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus, control system and device... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4281173