Lithographic apparatus comprising a gas flushing system

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Details

C355S053000

Reexamination Certificate

active

07106412

ABSTRACT:
A lithographic projection apparatus includes a radiation system constructed and arranged to supply a projection beam of radiation, a support structure constructed and arranged to support a patterning structure, the patterning structure constructed and arranged to pattern the projection beam according to a desired pattern, a substrate support constructed and arranged to support a substrate, and a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate. The apparatus further includes a gas flushing system comprising radial gas flow outlets, said gas flushing system being constructed and arranged to generate a radial gas flow through said radial gas flow outlets in an intermediate space defined between said gas flushing system and said substrate, wherein the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.

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patent: 6555834 (2003-04-01), Loopstra
patent: 6721031 (2004-04-01), Hasegawa et al.
patent: 6933513 (2005-08-01), Van Empel et al.
patent: 6954255 (2005-10-01), Hasegawa et al.
patent: 2002/0139247 (2002-10-01), Alvarez, Jr. et al.
patent: 2002/0191163 (2002-12-01), Hasegawa et al.
patent: 1 229 573 (2002-08-01), None

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