Lithographic apparatus and position measuring method

Details Lithographic apparatus and position measuring method Lithographic apparatus and position measuring method

2007-12-18

2007-12-18

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C356S399000

Reexamination Certificate

active

10957755

ABSTRACT:
In a lithographic apparatus, a measurement of the position of an object in an ambient space by an object position measuring system which is influenced by pressure variations in the ambient space, is corrected by an accurate measurement of the pressure in the ambient space. A pressure difference is measured between a pressure in a reference pressure volume and an ambient pressure in an ambient space. An absolute pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space. Alternatively, the pressure difference is integrated over time and a determined change of pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space.

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European Search Report issued for European Patent Application No. EP 05 07 7238, dated Dec. 8, 2005.

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