Lithographic apparatus and method utilizing dose control

Details Lithographic apparatus and method utilizing dose control Lithographic apparatus and method utilizing dose control

2006-10-17

2006-10-17

Perkey, W. B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S069000

Reexamination Certificate

active

07123348

ABSTRACT:
A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.

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Copy of European Search Report Application No. 05252536.7-2222 mailed by European Patent Office Feb. 21, 2006 3 pages.
Sanstrom T. et al. OML: Optical Maskless Lithography For Economic Design Prototyping and Small-Volume Production, Feb. 24, 2004, Proceedings of SPIE, Bellingham, VA, vol. 5377, No. 1.

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