Lithographic apparatus and method to determine beam...

Details Lithographic apparatus and method to determine beam... Lithographic apparatus and method to determine beam...

2005-03-22

2005-03-22

Nguyen, Kiet T. (Department: 2881)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000, C355S077000

Reexamination Certificate

active

06870603

ABSTRACT:
A lithographic apparatus is provided that has an aperture, a detector configured to detect an intensity of a radiation beam directed through the aperture and a processor configured to vary the intensity of the radiation beam through the aperture by a relative movement of the radiation beam and the aperture and to calculate a beam size of the radiation beam from the detected intensity and relative movement. Alternatively or in addition, a lithographic apparatus may include a focusing element configured to focus a part of a radiation beam in a focus plane, an aperture arranged in the focus plane of the focusing element, a detector configured to detect an intensity of the part of the radiation beam through the aperture, and a processor configured to vary the intensity of the radiation beam through the aperture by a change in a pointing direction of the radiation beam and to calculate a beam divergence of the radiation beam from the detected intensity and pointing direction. The apparatus offers a means to determine beam quality characteristics such as beam size and/or beam divergence.

REFERENCES:
patent: 4916319 (1990-04-01), Telfair et al.
patent: 5121160 (1992-06-01), Sano et al.
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5909274 (1999-06-01), Stucchi
patent: 4416988 (1995-11-01), None
European Search Report of EP 02079722.1 dated Aug. 20, 2003.

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