Lithographic apparatus and method for masking a substrate

Details Lithographic apparatus and method for masking a substrate Lithographic apparatus and method for masking a substrate

2007-04-05

2010-10-05

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S072000, C355S075000, C355S077000, C414S935000

Reexamination Certificate

active

07808612

ABSTRACT:
A method of removing a substrate from a substrate table of a lithographic apparatus. The substrate table is provided with a mask arranged to form a peripheral exposure exclusion region on a substrate. The method includes moving the mask from an in use position to a storage position. The storage position is adjacent to a projection system of the lithographic apparatus. The method also includes removing the substrate from the lithographic apparatus.

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