Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2005-12-21
2009-06-02
Rutledge, D. (Department: 2851)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S067000, C355S071000, C378S034000
Reexamination Certificate
active
07542127
ABSTRACT:
A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
REFERENCES:
patent: 4786947 (1988-11-01), Kosugi et al.
patent: 5715064 (1998-02-01), Lin
patent: 6731371 (2004-05-01), Shiraishi
patent: 6813026 (2004-11-01), McAninch
patent: 2001/0006422 (2001-07-01), Fukagawa et al.
patent: 2004/0156026 (2004-08-01), Kamiya
patent: 2004/0218158 (2004-11-01), Nishi
patent: 2005/0271558 (2005-12-01), Hara et al.
patent: 2006/0087631 (2006-04-01), Lallemant et al.
patent: 2008/0174750 (2008-07-01), Dansberg et al.
patent: 0 687 957 (1995-12-01), None
patent: 1 717 845 (2006-11-01), None
patent: WO 2005/081291 (2005-09-01), None
patent: WO 2005/081293 (2005-09-01), None
European Search Report issued for European Patent Application No. 06077157.3—1226, dated Apr. 18, 2007.
Singaporean Written Opinion and Search Report for Application No. SG 200608858-7 dated Jun. 5, 2008.
Beckers Marcel
Box Wilhelmus Josephus
Jansen Rob
Levasier Leon Martin
Loopstra Erik Roelof
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Rutledge D.
LandOfFree
Lithographic apparatus and method for manufacturing a device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic apparatus and method for manufacturing a device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and method for manufacturing a device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4071888