Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2005-09-29
2010-06-01
Kim, Peter B (Department: 2882)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S052000, C355S053000, C355S072000
Reexamination Certificate
active
07728951
ABSTRACT:
A lithographic apparatus is disclosed that includes a first gas shower configured to supply a first gas flow to an interior space of the apparatus, and a second gas shower configured to supply a second gas flow to the interior space of the apparatus, the gas showers configured to direct the first gas flow and the second gas flow at least partly towards each other. Also, a method for conditioning an interior space of a device manufacturing apparatus is provided that includes supplying a first conditioned gas flow and a second conditioned gas flow to the interior space, such that the first conditioned gas flow and the second conditioned gas flow are at least partly directed to each other.
REFERENCES:
patent: 4233123 (1980-11-01), Hammer, Jr.
patent: 4814625 (1989-03-01), Yabu
patent: 5469260 (1995-11-01), Takagi et al.
patent: 6020964 (2000-02-01), Loopstra et al.
patent: 6750946 (2004-06-01), Tanaka et al.
patent: 7050149 (2006-05-01), Owa et al.
patent: 2002/0191163 (2002-12-01), Hasegawa et al.
patent: 2006/0139594 (2006-06-01), Hara et al.
patent: 0 498 499 (1992-08-01), None
patent: 1 347 336 (2003-09-01), None
patent: 1 536 458 (2005-06-01), None
patent: 1 600 818 (2005-11-01), None
patent: 2000-036453 (2000-02-01), None
patent: WO 03105203 (2003-12-01), None
English translation of WO2003-105203, published Dec. 18, 2003.
European Search Report issued for European Patent Application No. 06076806.6-2222, dated Feb. 12, 2007.
Roset Niek Jacobus Johannes
Van Der Ham Ronald
Van Empel Tjarko Adriaan Rudolf
ASML Netherlands B.V.
Kim Peter B
Riddle Christina
Sterne Kessler Goldstein & Fox P.L.L.C.
LandOfFree
Lithographic apparatus and method for conditioning an... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic apparatus and method for conditioning an..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and method for conditioning an... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4198397