Lithographic apparatus and method

Details Lithographic apparatus and method Lithographic apparatus and method

2006-12-21

2010-11-16

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

07834980

ABSTRACT:
A method of lithography is disclosed that includes conditioning a radiation beam using an illumination system of a lithographic apparatus, imparting the radiation beam with a pattern in its cross-section, and projecting the patterned beam of radiation as an exposure field onto a substrate, wherein a periodic interference pattern is present in the exposure field, and relative motion is established between the substrate and a component in the illumination system, such that the periodic interference pattern is displaced in a direction which is not parallel to a direction of repetition of the periodic interference pattern.

REFERENCES:
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 5191374 (1993-03-01), Hazama et al.
patent: 5621499 (1997-04-01), Shiozawa
patent: 5684566 (1997-11-01), Stanton
patent: 6222615 (2001-04-01), Suzuki
patent: 6331885 (2001-12-01), Nishi

Affiliated with

Also associated with

Rating

Lithographic apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4204366