Lithographic apparatus and method

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S077000, C356S401000

Reexamination Certificate

active

06912041

ABSTRACT:
A lithographic apparatus according to one embodiment of the invention includes a movement detector configured to detect movement of the projection system and to generate a movement signal; a controller responsive to the movement signal and configured to generate a control signal; and an actuator assembly responsive to the control signal and configured to reduce movement of the projection system.

REFERENCES:
patent: 5187519 (1993-02-01), Takabayashi et al.
patent: 5726879 (1998-03-01), Sato
patent: 6036162 (2000-03-01), Hayashi
patent: 6297876 (2001-10-01), Bornebroek
patent: 6359688 (2002-03-01), Akimoto et al.
patent: 6417922 (2002-07-01), Dirksen et al.
patent: 6512641 (2003-01-01), Omura
patent: 2001/0038500 (2001-11-01), Shibazaki
patent: 1 041 607 (2000-10-01), None
Tsai and Yen, “Servo System Design of a High-Resolution Piezo-Driven Fine Stage for Step-and-Repeat Microlithography Systems,” IECON '99 Proceedings, pp. 11-16, Nov. 29, 1999.
Kouichi et al., “Large scale active microvibration control system using piezoelectric actuators applied to semiconductor manufacturing equipment,” Abstract No. XP-002186461, Nov. 1997.
A copy of the European Search Report dated Jan. 18, 2002, issued in the corresponding European Application No. 01202520.1.
Kouichi Kajiwara et al., “Large scale active microvibration control system using piezoelectric actuators applied to semiconductor manufacturing equipment,” Nippon Kikai Gakkai Ronbunshu, C Hen/Transactions of the Japan Society of Mechanical Engineers, vol. 63, No. 615, pp. 3735-3742 (Nov. 1997).

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