Lithographic apparatus and device manufacturing method using...

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Reexamination Certificate

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C355S067000, C378S034000, C378S035000

Reexamination Certificate

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07440078

ABSTRACT:
A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference exposure unit is an integer multiple of a size of an exposure area of the lithography unit corresponding to a single individually controllable element.

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Search Report, dated Jun. 28, 2007, for European Application No. 06256212.0-1226, 9 pgs.
Translation of Office Action for Korean Application No. 10-2006-0131207 drafted on Nov. 17, 2007, 4 pgs.

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