Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2011-06-14

2011-06-14

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

07961296

ABSTRACT:
A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into zeroth-order and first-order diffracted beams oppositely and asymmetrically inclined with respect to an optical axis. An area is identified where the first-order diffracted beam traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of the first-order diffracted beam in relation to the optical phase of the zeroth-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.

REFERENCES:
patent: 6310679 (2001-10-01), Shiraishi
patent: 6541167 (2003-04-01), Petersen et al.
patent: 6549266 (2003-04-01), Taniguchi
patent: 7525640 (2009-04-01), Jansen et al.
patent: 2008/0123066 (2008-05-01), Jansen et al.
patent: 2007-317847 (2007-12-01), None
Chinese Office Action dated Oct. 29, 2010 in related Chinese patent application No. 200910146623.9.

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