Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2005-08-02

2005-08-02

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S067000, C355S077000

Reexamination Certificate

active

06924885

ABSTRACT:
A projection beam PB is projected onto a substrate W via a mask MA. The direction dependence of the intensity of the beam at the substrate W is controlled by passing the beam through a series of optical elements120a-bin front of a pupil plane14. The intensity distribution as a function of position in the pupil plane14determines the angle dependence at the substrate W. The optical elements120a-b,which are preferably arrays of microlenses (or more particularly DOE's: Diffractive Optical Elements) each define an angle dependence of the intensity of the beam PB. The optical elements120a-bare each arranged to pass a major part of the beam PB substantially without deflection and a minor part with a deflection angle dependent intensity. The major part of the beam is blocked out of the beam behind the series of optical elements120a-b. As a result an addition of the effects of upon the intensity in the pupil plane14is realized.

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