Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2005-11-08
2005-11-08
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S053000, C356S401000
Reexamination Certificate
active
06963391
ABSTRACT:
A reflector alignment system uses an alignment beam propagating through a projection system that includes a mirror group to measure the apparent relative positions of two reference marks fixed to a reference frame on opposite sides of the projection system. Any movement of mirrors in the projection system will be detected as a shift in the apparent position of the reference marks.
REFERENCES:
patent: 4613230 (1986-09-01), Iwai
patent: 4856905 (1989-08-01), Nishi
patent: 6142641 (2000-11-01), Cohen et al.
patent: 6151120 (2000-11-01), Matsumoto et al.
patent: 6208707 (2001-03-01), Oshino
patent: 6249336 (2001-06-01), Ota
patent: 2004/0032575 (2004-02-01), Nishi et al.
patent: 5-160001 (1993-06-01), None
Chaudhuri et al., “Alignment of a multilayer-coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testing,”J. Vac. Sci. Technol. B13(6):3089-3093 (1995), XP 000558379.
Vaidya et al., “Extreme Ultraviolet Lithography for 0.1 μm Devices,”VLSI Technology, Systems and Applications, 1999. International Symposium on Taipei, Taiwan, Jun. 8-10, 1999, Piscataway, NJ, pp. 127-130, XP 10347511.
Fockert George Arie Jan
Van Der Laan Hans
Van Der Werf Jan Evert
ASML Netherlands B.V.
Kim Peter B.
Pillsbury Winthrop Shaw & Pittman LLP
LandOfFree
Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3496006