Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2008-07-08

2008-07-08

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S052000, C359S820000

Reexamination Certificate

active

07397531

ABSTRACT:
A lithographic apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one of the patterning device, or the projection system, and the illumination system includes a reflector assembly that includes a reflector substrate with a reflective surface for reflecting part of incident radiation, and a heat exchanger system that is constructed and arranged to exchange heat with the reflector substrate. The heat exchanger system includes a thermally active element that is disposed in a recess of the reflector substrate at a side of the reflector substrate that is different from the reflective surface.

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Natale M. Ceglio, Andrew M. Hawryluk, and Gary E. Sommargren, “Front-end design issues in soft-x-ray projection lithography,” Applied Optics, vol. 32 (No. 34), p. 7050-7056, (Dec. 1993).

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