Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2008-05-20

2008-05-20

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C355S053000, C355S067000, C355S068000, C355S071000, C378S034000

Reexamination Certificate

active

07375353

ABSTRACT:
An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device is provided to adjust the members in such a manner as to control the attenuation of the patterned radiation beam projected onto a target portion of a substrate across the cross-section of the patterned radiation beam. The attenuation control device includes a detector configured to provide an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the detector after attenuation by the member.

REFERENCES:
patent: 5315629 (1994-05-01), Jewell et al.
patent: 2003/0063266 (2003-04-01), Leenders et al.
patent: 2005/0134818 (2005-06-01), Van Dijsseldonk et al.
patent: 2005/0140957 (2005-06-01), Luijkx et al.

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