Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2008-02-29

2010-11-16

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C356S401000

Reexamination Certificate

active

07834977

ABSTRACT:
An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.

REFERENCES:
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3648587 (1972-03-01), Stevens
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4390273 (1983-06-01), Loebach et al.
patent: 4396705 (1983-08-01), Akeyama et al.
patent: 4465368 (1984-08-01), Matsuura et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5040020 (1991-08-01), Rauschenbach et al.
patent: 5121256 (1992-06-01), Corle et al.
patent: 5528118 (1996-06-01), Lee
patent: 5610683 (1997-03-01), Takahashi
patent: 5623853 (1997-04-01), Novak et al.
patent: 5646413 (1997-07-01), Nishi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 5874820 (1999-02-01), Lee
patent: 5900354 (1999-05-01), Batchelder
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6191429 (2001-02-01), Suwa
patent: 6236634 (2001-05-01), Lee et al.
patent: 6262796 (2001-07-01), Loopstra et al.
patent: 6400441 (2002-06-01), Nishi et al.
patent: 6600547 (2003-07-01), Watson et al.
patent: 6603130 (2003-08-01), Bisschops et al.
patent: 6633365 (2003-10-01), Suenaga
patent: 6778257 (2004-08-01), Bleeker et al.
patent: 7034917 (2006-04-01), Baselmans et al.
patent: 7215431 (2007-05-01), Opsal
patent: 2002/0020821 (2002-02-01), Van Santen et al.
patent: 2002/0041377 (2002-04-01), Hagiwara et al.
patent: 2002/0061469 (2002-05-01), Tanaka
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0123040 (2003-07-01), Almogy
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0021844 (2004-02-01), Suenaga
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0114117 (2004-06-01), Bleeker
patent: 2004/0135099 (2004-07-01), Simon et al.
patent: 2004/0136494 (2004-07-01), Lof et al.
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0211920 (2004-10-01), Derksen et al.
patent: 2004/0239954 (2004-12-01), Bischoff
patent: 2004/0263809 (2004-12-01), Nakano
patent: 2005/0007569 (2005-01-01), Streefkerk et al.
patent: 2005/0018155 (2005-01-01), Cox et al.
patent: 2005/0024609 (2005-02-01), De Smit et al.
patent: 2005/0030497 (2005-02-01), Nakamura
patent: 2005/0046813 (2005-03-01), Streefkerk et al.
patent: 2005/0046934 (2005-03-01), Ho et al.
patent: 2005/0052632 (2005-03-01), Miyajima
patent: 2005/0094116 (2005-05-01), Flagello et al.
patent: 2005/0094125 (2005-05-01), Arai
patent: 2005/0110973 (2005-05-01), Streefkerk et al.
patent: 2005/0122505 (2005-06-01), Miyajima
patent: 2005/0132914 (2005-06-01), Mulkens et al.
patent: 2005/0134815 (2005-06-01), Van Santen et al.
patent: 2005/0134817 (2005-06-01), Nakamura
patent: 2005/0140948 (2005-06-01), Tokita
patent: 2005/0146693 (2005-07-01), Ohsaki
patent: 2005/0146694 (2005-07-01), Tokita
patent: 2005/0151942 (2005-07-01), Kawashima
patent: 2005/0174549 (2005-08-01), Duineveld et al.
patent: 2005/0175940 (2005-08-01), Dierichs
patent: 2005/0200815 (2005-09-01), Akamatsu
patent: 2005/0213065 (2005-09-01), Kitaoka
patent: 2005/0213066 (2005-09-01), Sumiyoshi
patent: 2005/0219482 (2005-10-01), Baselmans et al.
patent: 2005/0219489 (2005-10-01), Nei et al.
patent: 2005/0225734 (2005-10-01), De Smit
patent: 2005/0233081 (2005-10-01), Tokita
patent: 2005/0243292 (2005-11-01), Baselmans et al.
patent: 2005/0264778 (2005-12-01), Lof et al.
patent: 2005/0280791 (2005-12-01), Nagasaka et al.
patent: 2006/0126044 (2006-06-01), Mizutani et al.
patent: 2007/0030467 (2007-02-01), Horikawa
patent: 206 607 (1984-02-01), None
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 242 880 (1987-02-01), None
patent: 0023231 (1981-02-01), None
patent: 0418427 (1991-03-01), None
patent: 0906590 (1999-04-01), None
patent: 1039511 (2000-09-01), None
patent: 1304597 (2003-04-01), None
patent: 1 420 300 (2004-05-01), None
patent: 2474708 (1981-07-01), None
patent: A 57-117238 (1982-07-01), None
patent: 58-202448 (1983-11-01), None
patent: A 59-19912 (1984-02-01), None
patent: A 61-44429 (1986-03-01), None
patent: 62-065326 (1987-03-01), None
patent: 62-121417 (1987-06-01), None
patent: 63-157419 (1988-06-01), None
patent: A 04-65603 (1992-03-01), None
patent: 04-305915 (1992-10-01), None
patent: 04-305917 (1992-10-01), None
patent: A 05-62877 (1993-03-01), None
patent: A 06-053120 (1994-02-01), None
patent: 06-124873 (1994-05-01), None
patent: A 06-188169 (1994-07-01), None
patent: 07-132262 (1995-05-01), None
patent: A 07-176468 (1995-07-01), None
patent: 07-220990 (1995-08-01), None
patent: A 08-37149 (1996-02-01), None
patent: A 08-316125 (1996-11-01), None
patent: A 08-330224 (1996-12-01), None
patent: A 10-163099 (1998-06-01), None
patent: 10-228661 (1998-08-01), None
patent: A 10-214783 (1998-08-01), None
patent: 10-255319 (1998-09-01), None
patent: 10-303114 (1998-11-01), None
patent: 10-340846 (1998-12-01), None
patent: A 11-16816 (1999-01-01), None
patent: 11-176727 (1999-07-01), None
patent: 2000-058436 (2000-02-01), None
patent: A 2000-505958 (2000-05-01), None
patent: 2001-091849 (2001-04-01), None
patent: A 2002-14005 (2002-01-01), None
patent: 2004-193252 (2004-07-01), None
patent: A 2004-247548 (2004-09-01), None
patent: A 2005-5713 (2005-01-01), None
patent: A 2005-86030 (2005-03-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 01/35168 (2001-05-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/053596 (2004-06-01), None
patent: WO 2004/053950 (2004-06-01), None
patent: WO 2004/053951 (2004-06-01), None
patent: WO 2004/053952 (2004-06-01), None
patent: WO 2004/053953 (2004-06-01), None
patent: WO 2004/053954 (2004-06-01), None
patent: WO 2004/053955 (2004-06-01), None
patent: WO 2004/053956 (2004-06-01), None
patent: WO 2004/053957 (2004-06-01), None
patent: WO 2004/053958 (2004-06-01), None
patent: WO 2004/053959 (2004-06-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057589 (2004-07-01), None
patent: WO 2004/057590 (2004-07-01), None
patent: WO 2004/090577 (2004-10-01), None
patent: WO 2004/090633 (2004-10-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/092830 (2004-10-01), None
patent: WO 2004/092833 (2004-10-01), None
patent: WO 2004/093130 (2004-10-01), None
patent: WO 2004/093159 (2004-10-01), None
patent: WO 2004/093160 (2004-10-01), None
patent: WO 2004/095135 (2004-11-01), None
patent: WO 2005/010611 (2005-02-01), None
patent: WO 2005/015615 (2005-02-01), None
patent: WO 2005/024517 (2005-03-01), None
patent: 2005/081293 (2005-09-01), None
M. Switkes et al., “Immersion Lithography at 157 nm”, MIT Lincoln Lab, Orlando 2001-1, Dec. 17, 2001.
M. Switkes et al., “Immersion Lithography at 157 nm”, J. Vac. Sci. Technol. B., vol. 19, No. 6, Nov./Dec. 2001, pp. 2353-2356.
M. Switkes et al., “Immersion Lithography: Optics for the 50 nm Node”, 157 Anvers-1, Sep. 4, 2002.
B.J. Lin, “Drivers, Prospects and Challenges for Immersion Lithography”, TSMC, Inc., Sep. 2002.
B.J. Lin, “Proximity Printing Through Liquid”, IBM Technical Disclosure Bulletin, vol. 20, No. 11B, Apr. 1978, p. 4997.
B.J. Lin, “The Paths To Subhalf-Micrometer Optical Lithography”, SPIE vol. 922, Optical/Laser Microlithography (1988), pp. 256-269.
G.W.W. Stevens, “Reduction of Waste Resulting from Mask Defects”, Solid State Technology, Aug. 1978, vol. 21 008, pp. 68-72.
S. Owa et al., “Immersion Lithography; its potential performance and issues”, SPIE Microlithography 2003, 5

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