Lithographic apparatus and device manufacturing method

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing

Reexamination Certificate

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C430S030000, C430S311000, C430S322000

Reexamination Certificate

active

07655367

ABSTRACT:
A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.

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International Search Report issued for International Patent Application No. PCT/EP2006/002677, dated Sep. 25, 2006.
van de Kerkhof et al., Full Optical Column Characterization of DUV Lithographic Projection Tools, Proceedings of SPIE, vol. 5377, 2004, pp. 1960-1970.
English translation of Korean Official Action issued on May 20, 2009 in Korean Application No. 10-2007-7023807.

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