Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2005-12-09
2009-12-01
Berman, Jack I (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492100
Reexamination Certificate
active
07626181
ABSTRACT:
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.
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ASML Netherlands B.V.
Berman Jack I
Chang Hanway
Sterne Kessler Goldstein & Fox P.L.L.C.
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