Lithographic apparatus and device manufacturing method

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S442110, C355S053000

Reexamination Certificate

active

07554105

ABSTRACT:
A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.

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European Search Report for App. No. EP 03 25 4358 mailed Nov. 11, 2004, 3 pgs.
Translation of Japanese Office Action issued in Japanese Application No. 2003-293218 mailed Aug. 15, 2006.

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