Lithographic apparatus and device manufacturing method

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C355S053000, C355S067000

Reexamination Certificate

active

07633073

ABSTRACT:
In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

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