Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Focus or magnification control

Reexamination Certificate

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C355S030000, C355S053000, C355S072000, C355S077000

Reexamination Certificate

active

07486381

ABSTRACT:
An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

REFERENCES:
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3648587 (1972-03-01), Stevens
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4390273 (1983-06-01), Loebach et al.
patent: 4396705 (1983-08-01), Akeyama et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5040020 (1991-08-01), Rauschenbach et al.
patent: 5121256 (1992-06-01), Corle et al.
patent: 5528118 (1996-06-01), Lee
patent: 5610683 (1997-03-01), Takahashi
patent: 5623853 (1997-04-01), Novak et al.
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 5874820 (1999-02-01), Lee
patent: 5900354 (1999-05-01), Batchelder
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6191429 (2001-02-01), Suwa
patent: 6236634 (2001-05-01), Lee et al.
patent: 6262796 (2001-07-01), Loopstra et al.
patent: 6400441 (2002-06-01), Nishi et al.
patent: 6560032 (2003-05-01), Hatano
patent: 6600547 (2003-07-01), Watson et al.
patent: 6603130 (2003-08-01), Bisschops et al.
patent: 6633365 (2003-10-01), Suenaga
patent: 6778257 (2004-08-01), Bleeker et al.
patent: 2002/0020821 (2002-02-01), Van Santen et al.
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0123040 (2003-07-01), Almogy
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0021844 (2004-02-01), Suenaga
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0119954 (2004-06-01), Kawashima et al.
patent: 2004/0125351 (2004-07-01), Krautschik
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0257544 (2004-12-01), Vogel et al.
patent: 2004/0263809 (2004-12-01), Nakano
patent: 2005/0068499 (2005-03-01), Dodoc et al.
patent: 2005/0073670 (2005-04-01), Carroll
patent: 2005/0088635 (2005-04-01), Hoogendam et al.
patent: 2005/0140948 (2005-06-01), Tokita
patent: 2005/0145265 (2005-07-01), Ravkin et al.
patent: 2005/0217135 (2005-10-01), O'Donnell et al.
patent: 2005/0217137 (2005-10-01), Smith et al.
patent: 2005/0217703 (2005-10-01), O'Donnell
patent: 2005/0219481 (2005-10-01), Cox et al.
patent: 2005/0233081 (2005-10-01), Tokita
patent: 2005/0253090 (2005-11-01), Gau et al.
patent: 2005/0259234 (2005-11-01), Hirukawa et al.
patent: 2005/0280791 (2005-12-01), Nagasaka et al.
patent: 2005/0286032 (2005-12-01), Lof et al.
patent: 2006/0005860 (2006-01-01), Garcia
patent: 2006/0066828 (2006-03-01), Klerk
patent: 2006/0098177 (2006-05-01), Nagasaka
patent: 2006/0114445 (2006-06-01), Ebihara
patent: 2006/0119807 (2006-06-01), Baselmans et al.
patent: 2006/0139613 (2006-06-01), Houkes et al.
patent: 2007/0081136 (2007-04-01), Hara
patent: 206 607 (1984-02-01), None
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 224448 (1985-07-01), None
patent: 242880 (1987-02-01), None
patent: 0023231 (1981-02-01), None
patent: 0418427 (1991-03-01), None
patent: 0 834 773 (1998-04-01), None
patent: 1039511 (2000-09-01), None
patent: 1 420 298 (2004-05-01), None
patent: 1 420 300 (2004-05-01), None
patent: 1 477 856 (2004-11-01), None
patent: 2474708 (1981-07-01), None
patent: 58-202448 (1983-11-01), None
patent: A 59-19912 (1984-02-01), None
patent: 62-065326 (1987-03-01), None
patent: 62-121417 (1987-06-01), None
patent: 63-157419 (1988-06-01), None
patent: 04-305915 (1992-10-01), None
patent: 04-305917 (1992-10-01), None
patent: A 05-62877 (1993-03-01), None
patent: A 6-53120 (1994-02-01), None
patent: 06-124873 (1994-05-01), None
patent: A 6-188169 (1994-07-01), None
patent: 07-132262 (1995-05-01), None
patent: 07-220990 (1995-08-01), None
patent: A 08-316125 (1996-11-01), None
patent: A 8-330224 (1996-12-01), None
patent: A 8-166475 (1998-06-01), None
patent: A 10-163099 (1998-06-01), None
patent: 10-228661 (1998-08-01), None
patent: A 10-214783 (1998-08-01), None
patent: 10-255319 (1998-09-01), None
patent: 10-303114 (1998-11-01), None
patent: 10-340846 (1998-12-01), None
patent: A 11-135400 (1999-05-01), None
patent: 11-176727 (1999-07-01), None
patent: 2000-058436 (2000-02-01), None
patent: A 2000-505958 (2000-05-01), None
patent: 2001-091849 (2001-04-01), None
patent: 2004-193252 (2004-07-01), None
patent: A-2005-109426 (2005-04-01), None
patent: A-2005-116571 (2005-04-01), None
patent: A-2005-129914 (2005-05-01), None
patent: A-2005-159322 (2005-06-01), None
patent: A-2005-183744 (2005-07-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 01/35168 (2001-05-01), None
patent: WO 03/077036 (2003-09-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/053596 (2004-06-01), None
patent: WO 2004/053950 (2004-06-01), None
patent: WO 2004/053951 (2004-06-01), None
patent: WO 2004/053952 (2004-06-01), None
patent: WO 2004/053953 (2004-06-01), None
patent: WO 2004/053954 (2004-06-01), None
patent: WO 2004/053955 (2004-06-01), None
patent: WO 2004/053956 (2004-06-01), None
patent: WO 2004/053957 (2004-06-01), None
patent: WO 2004/053958 (2004-06-01), None
patent: WO 2004/053959 (2004-06-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057589 (2004-07-01), None
patent: WO 2004/057590 (2004-07-01), None
patent: WO 2004/086468 (2004-10-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/105106 (2004-12-01), None
patent: WO 2004/107048 (2004-12-01), None
patent: WO 2004/114380 (2004-12-01), None
patent: WO 2005/003864 (2005-01-01), None
patent: WO 2005/006417 (2005-01-01), None
patent: WO 2005/024517 (2005-03-01), None
patent: WO 2005/057635 (2005-06-01), None
patent: WO 2006/007111 (2006-01-01), None
patent: WO 2006/009573 (2006-01-01), None
English translation of the German Patent document DD 221 563 A1 cited by Applicant, dated Apr. 24, 1985.
R.D. Mih et al., “Using the focus monitor test mask to characterize lithographic performance”, SPIE, vol. 2440, pp. 657-665, dated May 1995.
T.A. Brunner et al., “Quantitative stepper metrology using the focus monitor test mask”, SPIE, vol. 2197, pp. 541-549, dated May 1994.
M. Switkes et al., “Immersion Lithography at 157 nm”, MIT Lincoln Lab, Orlando 2001-1, Dec. 17, 2001.
M. Switkes et al., “Immersion Lithography at 157 nm”, J. Vac. Sci. Technol. B., vol. 19, No. 6, Nov./Dec. 2001, pp. 2353-2356.
M. Switkes et al., “Immersion Lithography: Optics for the 50 nm Node”, 157 Anvers-1, Sep. 4, 2002.
B.J. Lin, “Drivers, Prospects and Challenges for Immersion Lithography”, TSMC, Inc., Sep. 2002.
B.J. Lin, “Proximity Printing Through Liquid”, IBM Technical Disclosure Bulletin, vol. 20, No. 11B, Apr. 1978, p. 4997.
B.J. Lin, “The Paths To Subhalf-Micrometer Optical Lithography”, SPIE vol. 922, Optical/Laser Microlithography (1988), pp. 256-269.
G.W.W. Stevens, “Reduction of Waste Resulting from Mask Defects”, Solid State Technology, Aug. 1978, vol. 21 008, pp. 68-72.
S. Owa et al., “Immersion Lithography: its potential performance and issues”, SPIE Microlithography 2003, 5040-186, Feb. 27, 2003.
S. Owa et al., “Advantage and Feasibility of Immersion Lithography”, Proc. SPIE 5040 (2003).
Nikon Precision Europe GmbH, “Investor Relations—Nikon's Real Solutions”, May 15, 2003.
H. Kawata et al., “Optical Projection Lithography using Lenses with Numerical Apertures Greater than Unity”, Microelectronic Engineering 9 (1989), pp. 31-36.
J.A. Hoffnagle et al., “Liquid Immersion Deep-Ultraviolet Interferometric Lithography”, J. Vac. Sci. Technol. B., vol. 17, No. 6, Nov./Dec. 1999, pp. 3306-3309.
B.W. Smith et al., “Immersion Optical Lithography at 193nm&#x

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