Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S053000, C355S030000

Reexamination Certificate

active

07362415

ABSTRACT:
A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.

REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6552773 (2003-04-01), Emoto
patent: 6687041 (2004-02-01), Sandstrom
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 7023528 (2006-04-01), Hsu et al.
patent: 7106414 (2006-09-01), Tsuji et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0051984 (2004-03-01), Oshino et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 2005/0007572 (2005-01-01), George et al.
patent: 2005/0074906 (2005-04-01), Kochersperger
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None

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