Lithographic apparatus and device manufacturing method

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement

Reexamination Certificate

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C430S311000, C430S322000

Reexamination Certificate

active

07491478

ABSTRACT:
Control of exposures is based at least in part on the relative contrast loss for a source spectrum and an pattern to be projected or an average absolute detuning of the source.

REFERENCES:
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patent: 2001/0026448 (2001-10-01), Koizumi et al.
patent: 09199403 (1997-07-01), None
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Uthara Srinivasan et al. “Alkyltrichlorosilane-Based Self-Assembled Monolayer Films for Stiction Reduction in Silicon Micromachines”, Journal of Microelectromechanical Systems, Jun. 1998, vol. 7., No. 2, pp. 252-260.
P.F. Man et al., “Elimination of Post-Release Adhesion in Microstructures Using Thin Conformal Fluorocarbon Films”, Proceedings IEEE Micro Electro Mechanical Systems Workshop, San Diego, CA, 1996, pp. 55-60.

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