Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-04-04

2008-08-19

Kosowski, Alexander J (Department: 2128)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S095000, C716S030000, C438S401000

Reexamination Certificate

active

07415319

ABSTRACT:
Correcting for misalignment of a substrate before it is exposed is performed using offset corrections and process corrections that are calculated based on alignment offset measurements of alignment marks and overlay measurements of overlay targets on substrates in previous batches.

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Partial European Search Report issued in European Application No. 07251283.3-1226 dated Jul. 24, 2007.

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