Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S075000, C430S311000

Reexamination Certificate

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07417711

ABSTRACT:
A lithographic projection apparatus in which a balance mass is supported by a base frame using at least one supporting member which is coupled to both the base frame and balance mass. Free horizontal movement is provided by providing the supporting member with at least two pivot points.

REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6046792 (2000-04-01), Van Der Werf et al.
patent: 6449030 (2002-09-01), Kwan
patent: 6499936 (2002-12-01), Ishigame
patent: 2001/0006762 (2001-07-01), Kwan et al.
patent: 2002/0012108 (2002-01-01), Hara et al.
patent: 2003/0202865 (2003-10-01), Ponnekanti et al.
patent: 1 111 469 (2001-06-01), None
patent: 1 111 470 (2001-06-01), None
patent: 63-153819 (1988-06-01), None
patent: 64-40089 (1989-03-01), None
patent: 5-335199 (1993-12-01), None
patent: 2002-15985 (2002-01-01), None
patent: 2002-22868 (2002-01-01), None
patent: 2002-25903 (2002-01-01), None
patent: 98/33096 (1998-07-01), None
patent: 98/38597 (1998-09-01), None
patent: 98/40791 (1998-09-01), None
English Translation of JP 2002-022868 (dated Jan. 23, 2002).
English Translation of JP 5335199 (dated Dec. 17, 1993).
European Search Report dated Jul. 10, 2003.
European Search Report for Application No. EP 03 25 6067 completed Feb. 4, 2004.
Japanese Office Action for Japanese Patent Application No. 2003-373440.

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