Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2004-01-29

2008-09-09

Fuller, Rodney E (Department: 2862)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000

Reexamination Certificate

active

07423722

ABSTRACT:
A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.

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Translation of Notice of Reasons for Rejection dated Jan. 29, 2008 for Japanese Patent Application No. 2005-020587.

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