Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2005-01-25

2008-09-09

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000

Reexamination Certificate

active

07423727

ABSTRACT:
A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a radially varying birefringence.

REFERENCES:
patent: 6057970 (2000-05-01), Kim et al.
patent: 6310679 (2001-10-01), Shiraishi
patent: 6404482 (2002-06-01), Shiraishi
patent: 6636349 (2003-10-01), Takahashi et al.
patent: 6844972 (2005-01-01), McGuire, Jr.
patent: 7084960 (2006-08-01), Schenker et al.
patent: 2005/0243222 (2005-11-01), Maul et al.

Affiliated with

Also associated with

Rating

Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3981128