Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2011-03-08

2011-03-08

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

07903232

ABSTRACT:
An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between those components.

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English translation of Official Action issued Mar. 20, 2008 in corresponding Korean Application No. 10-2007-0035909.

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