Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2008-07-15

2008-07-15

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S071000

Reexamination Certificate

active

10853723

ABSTRACT:
A lithographic apparatus comprises an illumination system for providing a projection beam of radiation. A support structure is provided for supporting a patterning device, the patterning device serving to impart the projection beam with a pattern in its cross-section. A substrate table holds a substrate, while a projection system projects the patterned beam onto a target portion of the substrate. The illumination system comprises a field defining element arranged to define an illuminating field in the plane of the patterning device or in a plane conjugate thereto, the field being off-axis with respect to the optical axis of the illuminating system.

REFERENCES:
patent: 6259513 (2001-07-01), Gallatin et al.
patent: 7030965 (2006-04-01), Takahashi
patent: 2002/0085276 (2002-07-01), Tanitsu et al.
patent: 2002/0111606 (2002-08-01), Lemberg
patent: 2003/0038931 (2003-02-01), Toyoda et al.
patent: 2003/0227609 (2003-12-01), Oskotsky et al.
patent: 2004/0130806 (2004-07-01), Takahashi
patent: 1 372 034 (2003-12-01), None
patent: WO 02/35273 (2002-05-01), None

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