Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S067000

Reexamination Certificate

active

11312649

ABSTRACT:
Lithographic apparatus includes an illumination system for conditioning a radiation beam, a support for supporting a patterning device for imparting a cross-sectional pattern to the radiation beam to form a patterned radiation beam, and a substrate table for holding a substrate. A projection system is provided for projecting the patterned radiation beam onto a target portion of the substrate. Conditioning optics and an adjustable aperture are provided to condition the radiation beam from the illumination system, and a detector is provided to detect the size and divergence of the radiation beam propagated through the aperture and to provide a feedback signal in dependence thereon. An actuator serves to effect adjustment of at least one of the optics and the aperture to vary at least one optical characteristic of the radiation beam, and a control device is provided to control the actuator in response to the feedback signal from the detector.

REFERENCES:
patent: 5121160 (1992-06-01), Sano et al.
patent: 5724122 (1998-03-01), Oskotsky
patent: 5991016 (1999-11-01), Irie
patent: 6870603 (2005-03-01), Teeuwen
patent: 2004/0114122 (2004-06-01), Teeuwen
patent: 2005/0270608 (2005-12-01), Shiozawa et al.

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