Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2008-05-27

2008-05-27

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000, C355S075000

Reexamination Certificate

active

11023630

ABSTRACT:
A lithographic apparatus includes an illumination system for conditioning a radiation beam. A support structure supports a patterning device, which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table holds a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. A motion control system includes a controller having a transfer function. The controller controls a position of the support structure and or the substrate table along a series of positions. The transfer function consists of a sum of a plurality of positional transfer functions, each determined in one of the positions, and each multiplied by a weighing function.

REFERENCES:
patent: 5812396 (1998-09-01), Kato
patent: 6714842 (2004-03-01), Ito
patent: 7098990 (2006-08-01), Butler
patent: 2006/0119829 (2006-06-01), Cox et al.

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