Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2008-05-20
2008-05-20
Rutledge, D. (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S067000, C378S034000
Reexamination Certificate
active
11092964
ABSTRACT:
An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.
REFERENCES:
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3648587 (1972-03-01), Stevens
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4390273 (1983-06-01), Loebach et al.
patent: 4396705 (1983-08-01), Akeyama et al.
patent: 4465368 (1984-08-01), Matsuura et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5040020 (1991-08-01), Rauschenbach et al.
patent: 5121256 (1992-06-01), Corle et al.
patent: 5528118 (1996-06-01), Lee
patent: 5610683 (1997-03-01), Takahashi
patent: 5623853 (1997-04-01), Novak et al.
patent: 5646413 (1997-07-01), Nishi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 5874820 (1999-02-01), Lee
patent: 5900354 (1999-05-01), Batchelder
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6191429 (2001-02-01), Suwa
patent: 6236634 (2001-05-01), Lee et al.
patent: 6262796 (2001-07-01), Loopstra et al.
patent: 6400441 (2002-06-01), Nishi et al.
patent: 6600547 (2003-07-01), Watson et al.
patent: 6603130 (2003-08-01), Bisschops et al.
patent: 6778257 (2004-08-01), Bleeker et al.
patent: 7034917 (2006-04-01), Baselmans et al.
patent: 7215431 (2007-05-01), Opsal
patent: 2002/0020821 (2002-02-01), Van Santen et al.
patent: 2002/0041377 (2002-04-01), Hagiwara et al.
patent: 2002/0061469 (2002-05-01), Tanaka
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0123040 (2003-07-01), Almogy
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0114117 (2004-06-01), Bleeker
patent: 2004/0136494 (2004-07-01), Lof et al.
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0211920 (2004-10-01), Derksen et al.
patent: 2004/0239954 (2004-12-01), Bischoff
patent: 2004/0263809 (2004-12-01), Nakano
patent: 2005/0007569 (2005-01-01), Streefkerk et al.
patent: 2005/0018155 (2005-01-01), Cox et al.
patent: 2005/0024609 (2005-02-01), De Smit et al.
patent: 2005/0030497 (2005-02-01), Nakamura
patent: 2005/0046813 (2005-03-01), Streefkerk et al.
patent: 2005/0046934 (2005-03-01), Ho et al.
patent: 2005/0052632 (2005-03-01), Miyajima
patent: 2005/0094116 (2005-05-01), Flagello et al.
patent: 2005/0094125 (2005-05-01), Arai
patent: 2005/0122505 (2005-06-01), Miyajima
patent: 2005/0132914 (2005-06-01), Mulkens et al.
patent: 2005/0134817 (2005-06-01), Nakamura
patent: 2005/0140948 (2005-06-01), Tokita
patent: 2005/0146693 (2005-07-01), Ohsaki
patent: 2005/0146694 (2005-07-01), Tokita
patent: 2005/0151942 (2005-07-01), Kawashima
patent: 2005/0200815 (2005-09-01), Akamatsu
patent: 2005/0213065 (2005-09-01), Kitaoka
patent: 2005/0213066 (2005-09-01), Sumiyoshi
patent: 2005/0219482 (2005-10-01), Baselmans et al.
patent: 2005/0219489 (2005-10-01), Nei et al.
patent: 2005/0233081 (2005-10-01), Tokita
patent: 2005/0280791 (2005-12-01), Nagasaka et al.
patent: 2006/0126044 (2006-06-01), Mizutani et al.
patent: 2007/0030467 (2007-02-01), Horikawa
patent: 206 607 (1984-02-01), None
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 242 880 (1987-02-01), None
patent: 0023231 (1981-02-01), None
patent: 0418427 (1991-03-01), None
patent: 1039511 (2000-09-01), None
patent: 1 420 300 (2004-05-01), None
patent: 2474708 (1981-07-01), None
patent: A 57-117238 (1982-07-01), None
patent: 58-202448 (1983-11-01), None
patent: A 59-19912 (1984-02-01), None
patent: A 61-44429 (1986-03-01), None
patent: 62-065326 (1987-03-01), None
patent: 62-121417 (1987-06-01), None
patent: 63-157419 (1988-06-01), None
patent: A 04-65603 (1992-03-01), None
patent: 04-305915 (1992-10-01), None
patent: 04-305917 (1992-10-01), None
patent: A 05-62877 (1993-03-01), None
patent: A 06-053120 (1994-02-01), None
patent: 06-124873 (1994-05-01), None
patent: A 06-188169 (1994-07-01), None
patent: 07-132262 (1995-05-01), None
patent: A 07-176468 (1995-07-01), None
patent: 07-220990 (1995-08-01), None
patent: A 08-37149 (1996-02-01), None
patent: A 08-316125 (1996-11-01), None
patent: A 08-330224 (1996-12-01), None
patent: A 10-163099 (1998-06-01), None
patent: 10-228661 (1998-08-01), None
patent: A 10-214783 (1998-08-01), None
patent: 10-255319 (1998-09-01), None
patent: 10-303114 (1998-11-01), None
patent: 10-340846 (1998-12-01), None
patent: A 11-16816 (1999-01-01), None
patent: 11-176727 (1999-07-01), None
patent: 2000-058436 (2000-02-01), None
patent: A 2000-505958 (2000-05-01), None
patent: 2001-091849 (2001-04-01), None
patent: A 2002-14005 (2002-01-01), None
patent: 2004-193252 (2004-07-01), None
patent: A 2004-247548 (2004-09-01), None
patent: A 2005-5713 (2005-01-01), None
patent: A 2005-86030 (2005-03-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 01/35168 (2001-05-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/053596 (2004-06-01), None
patent: WO 2004/053950 (2004-06-01), None
patent: WO 2004/053951 (2004-06-01), None
patent: WO 2004/053952 (2004-06-01), None
patent: WO 2004/053953 (2004-06-01), None
patent: WO 2004/053954 (2004-06-01), None
patent: WO 2004/053955 (2004-06-01), None
patent: WO 2004/053956 (2004-06-01), None
patent: WO 2004/053957 (2004-06-01), None
patent: WO 2004/053958 (2004-06-01), None
patent: WO 2004/053959 (2004-06-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057589 (2004-07-01), None
patent: WO 2004/057590 (2004-07-01), None
patent: WO 2004/090577 (2004-10-01), None
patent: WO 2004/090633 (2004-10-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/092830 (2004-10-01), None
patent: WO 2004/092833 (2004-10-01), None
patent: WO 2004/093130 (2004-10-01), None
patent: WO 2004/093159 (2004-10-01), None
patent: WO 2004/093160 (2004-10-01), None
patent: WO 2004/095135 (2004-11-01), None
patent: WO 2005/010611 (2005-02-01), None
patent: WO 2005/015615 (2005-02-01), None
patent: WO 2005/024517 (2005-03-01), None
M. Switkes et al., “Immersion Lithography at 157 nm”, MIT Lincoln Lab, Orlando 2001-1, Dec. 17, 2001.
M. Switkes et al., “Immersion Lithography at 157 nm”, J. Vac. Sci. Technol. B., vol. 19, No. 6, Nov./Dec. 2001, pp. 2353-2356.
M. Switkes et al., “Immersion Lithography: Optics for the 50 nm Node”, 157 Anvers-1, Sep. 4, 2002.
B.J. Lin, “Drivers, Prospects and Challenges for Immersion Lithography”, TSMC, Inc., Sep. 2002.
B.J. Lin, “Proximity Printing Through Liquid”, IBM Technical Disclosure Bulletin, vol. 20, No. 11B, Apr. 1978, p. 4997.
B.J. Lin, “The Paths To Subhalf-Micrometer Optical Lithography”, SPIE vol. 922, Optical/Laser Microlithography (1988), pp. 256-269.
G.W.W. Stevens, “Reduction of Waste Resulting from Mask Defects”, Solid State Technology, Aug. 1978, vol. 21 008, pp. 68-72.
S. Owa et al., “Immersion Lithography; its potential performance and issues”, SPIE Microlithography 2003, 5040-186, Feb. 27, 2003.
S. Owa et al., “Advantage and Feasibility of Immersion Lithography”, Proc. SPIE 5040 (2003).
Nikon Precision Europe GmbH, “Investor Relations—Nikon's Real Solutions”, May 15, 2003.
H. Kawata et al., “Optical Projection Lithography using Lenses with Numerical Apertures Greater than Unity”, Microelectronic Engineering 9 (1989), pp. 31-36.
J.A. Hoffnagle et al., “Liquid Immersion Deep-Ultraviolet Interferometric Lithography”, J. Vac. Sci. Technol. B., vol. 17, No. 6, Nov./Dec. 1999, pp. 3306-3309.
B.W. Smith et al., “Immersion Optical Lithography at 193nm”, FUTURE FAB Internat
Baselmans Johannes Jacobus Matheus
Donders Sjoerd Nicolaas Lambertus
Hoogedam Christiaan Alexander
Jansen Hans
Mertens Jeroen Johannes Sophia Maria
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Rutledge D.
LandOfFree
Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3911770