Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2007-12-25

2007-12-25

Fuller, Rondey (Department: 2862)

Photocopying

Projection printing and copying cameras

Step and repeat

C356S400000, C356S401000

Reexamination Certificate

active

10920328

ABSTRACT:
An off-axis alignment system in a lithographic projection apparatus uses broadband radiation to illuminate a phase grating on the wafer. The broadband radiation source may include fluorescent materials, e.g. Yag:Ce or ND:Yag crystals illuminated by excitation light.

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