Lithographic apparatus and device manufacturing method

Radiant energy – Irradiation of objects or material

Reexamination Certificate

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C250S548000, C355S067000

Reexamination Certificate

active

11019524

ABSTRACT:
A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.

REFERENCES:
patent: 6414743 (2002-07-01), Nishi et al.
patent: 6563128 (2003-05-01), Lublin et al.
patent: 2003/0007138 (2003-01-01), Shigematsu et al.
patent: 2004/0114121 (2004-06-01), Nishi et al.

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