Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000, C355S071000, C355S055000

Reexamination Certificate

active

11373503

ABSTRACT:
A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.

REFERENCES:
patent: 5696623 (1997-12-01), Fujie et al.
patent: 0 706 042 (1996-04-01), None
patent: 0 874 283 (1998-10-01), None
patent: 0 874 283 (2000-01-01), None
patent: 1 037 036 (2000-09-01), None
patent: 1 526 550 (2005-04-01), None
patent: 2005-123305 (2005-05-01), None
patent: WO 2005/111722 (2005-11-01), None
International Search Report issued for PCT Application PCT/NL2004/000927 on Dec. 19, 2005.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3854169

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.