Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2007-11-20

2007-11-20

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S071000

Reexamination Certificate

active

11154950

ABSTRACT:
The present invention provides a lithographic apparatus, including: a substrate table constructed to hold a substrate; a projection system configured to project a radiation beam through an exposure slit area onto a target portion of the substrate; a patterning device configured to import the radiation beam with a pattern in its cross-section to form a patterned radiation beam, the patterned radiation beam at the target portion of the substrate being in focus over a depth of focus; and a measurement system that is arranged to measure a surface topography of at least part of the target portion, wherein the projection system is arranged to adjust a dimension of the exposure slit area to form an adjusted exposure slit area over which surface topography variations are equal to or smaller than the depth of focus.

REFERENCES:
patent: 5191200 (1993-03-01), Van der Werf et al.
patent: 6046792 (2000-04-01), Van Der Werf et al.

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