Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2007-09-25

2007-09-25

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

C355S053000, C355S067000

Reexamination Certificate

active

10995525

ABSTRACT:
A lithographic apparatus includes an illumination system configured to provide a beam of radiation of radiation; a support configured to support a patterning device configured to impart a pattern to the beam of radiation; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate, the projection system and/or illumination system including a focusing element; a plurality of stop discs each having an aperture therethrough different from the size and/or shape of the apertures of the other stop discs; and a mechanism configured to exchangeably place a selected one of the stop discs adjacent to the focusing element.

REFERENCES:
patent: 5726740 (1998-03-01), Shiozawa et al.
patent: 6304317 (2001-10-01), Taniguchi et al.
patent: 6522390 (2003-02-01), Suzuki et al.
patent: 6538722 (2003-03-01), Matsumoto et al.
patent: 6661498 (2003-12-01), Hirukawa
patent: 6930754 (2005-08-01), Sugita et al.

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