Lithographic apparatus and device manufacturing method...

Geometrical instruments – Miscellaneous – Light direction

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C033S533000, C356S614000

Reexamination Certificate

active

11140581

ABSTRACT:
A lithographic apparatus comprising a first frame and a second frame, the first frame and the second frame being moveable in a first direction relative to one another. The first frame is provided with a ruler having distance indicators disposed in the first direction for monitoring by an associated ruler monitoring sensor. The second frame is provided with a second sensor arranged to measure the distance between the second sensor and the ruler in a second direction orthogonal to the first direction, using the ruler as a reference surface.

REFERENCES:
patent: 4475289 (1984-10-01), Nelle
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5495279 (1996-02-01), Sandstrom
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5640008 (1997-06-01), Bosch et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5832416 (1998-11-01), Anderson
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6583413 (2003-06-01), Shinada et al.
patent: 6687041 (2004-02-01), Sandstrom
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 2002/0072012 (2002-06-01), Nakasugi et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 2005/0007572 (2005-01-01), George et al.
patent: 2005/0128461 (2005-06-01), Beems et al.
patent: 11272415 (1999-10-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic apparatus and device manufacturing method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3787762

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.