Geometrical instruments – Miscellaneous – Light direction
Reexamination Certificate
2007-04-03
2007-04-03
Smith, R. Alexander (Department: 2859)
Geometrical instruments
Miscellaneous
Light direction
C033S533000, C356S614000
Reexamination Certificate
active
11140581
ABSTRACT:
A lithographic apparatus comprising a first frame and a second frame, the first frame and the second frame being moveable in a first direction relative to one another. The first frame is provided with a ruler having distance indicators disposed in the first direction for monitoring by an associated ruler monitoring sensor. The second frame is provided with a second sensor arranged to measure the distance between the second sensor and the ruler in a second direction orthogonal to the first direction, using the ruler as a reference surface.
REFERENCES:
patent: 4475289 (1984-10-01), Nelle
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5495279 (1996-02-01), Sandstrom
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5640008 (1997-06-01), Bosch et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5832416 (1998-11-01), Anderson
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6583413 (2003-06-01), Shinada et al.
patent: 6687041 (2004-02-01), Sandstrom
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 2002/0072012 (2002-06-01), Nakasugi et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 2005/0007572 (2005-01-01), George et al.
patent: 2005/0128461 (2005-06-01), Beems et al.
patent: 11272415 (1999-10-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
Lof Joeri
Rutten Jeroen Hendrik Gerardus Christiaan
ASML Netherlands B.V.
Smith R. Alexander
Sterne Kessler Goldstein & Fox P.L.L.C.
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