Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2011-06-28

2011-06-28

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S075000, C355S077000

Reexamination Certificate

active

07969550

ABSTRACT:
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a shield device arranged between a source of air flows and/or pressure waves and an element sensitive for the air flows and/or pressure waves.

REFERENCES:
patent: 4226299 (1980-10-01), Hansen
patent: 6450288 (2002-09-01), Akiyama et al.
patent: 6757048 (2004-06-01), Arakawa
patent: 7492441 (2009-02-01), Van Empel
patent: 2004/0017167 (2004-01-01), Nishi
patent: 2005/0012912 (2005-01-01), Draaijer et al.
patent: 2005/0052633 (2005-03-01), Mori et al.
patent: 2005/0168712 (2005-08-01), Miyajima
patent: 2009/0195760 (2009-08-01), Hempenius et al.

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