Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2007-09-04

2007-09-04

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000

Reexamination Certificate

active

11022950

ABSTRACT:
A lithographic apparatus includes a first movable element (such as an immersion liquid supply system), which is in operation in contact with a surface of a second movable element (such as a substrate table). Further, the lithographic apparatus includes a second element controller (such as a substrate table controller) to control a position quantity of the second movable element. Disturbance forces caused by, e.g., movements of the first and second movable elements with respect to each other, due to capillary forces disturb a position of the first and second movable elements. To at least partly correct a position of the second movable element due to such disturbance forces, the lithographic apparatus includes a feedforward control path to provide a disturbance force feedforward signal to the second element controller, the feedforward control path including a disturbance force estimator to estimate a disturbance force from a position quantity of the first movable element.

REFERENCES:
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5757149 (1998-05-01), Sato et al.
patent: 6504162 (2003-01-01), Binnard et al.
patent: 6654098 (2003-11-01), Asano et al.
patent: 6727977 (2004-04-01), Butler
patent: 7098990 (2006-08-01), Butler
patent: 7136148 (2006-11-01), Eussen
patent: 03257072.3 (2002-11-01), None
patent: 03252955.4 (2003-05-01), None
patent: 1 420 302 (2003-11-01), None
patent: WO99/49504 (1999-09-01), None
patent: WO99/49504 (1999-09-01), None
patent: 2004/092845 (2004-10-01), None
European Search Report issued in EP 05 07 8034 dated Mar. 6, 2006.

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