Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2007-05-29

2007-05-29

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000

Reexamination Certificate

active

11019525

ABSTRACT:
A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.

REFERENCES:
patent: 6452662 (2002-09-01), Mulkens et al.
patent: 6513953 (2003-02-01), Itoh
patent: 6527393 (2003-03-01), Ogawa
patent: 6607276 (2003-08-01), Akiyama
patent: 2005/0225978 (2005-10-01), Simaoka et al.
patent: 05-346557 (1993-12-01), None

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