Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2007-04-03

2007-04-03

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S069000, C355S077000

Reexamination Certificate

active

10857351

ABSTRACT:
A lithographic apparatus comprises an illumination system for providing a projection beam of radiation and a support structure for supporting a patterning device which impart the projection beam with a pattern in its cross-section. The patterning device has a non-flat critical dimension (CD) profile across its width. A projection system projects the patterned beam onto a target portion of a substrate. Dose variation device for varying the radiation dose across the width of the target portion compensates for the non-flat CD profile of the patterning device.

REFERENCES:
patent: 6493063 (2002-12-01), Seltmann et al.
patent: 6869739 (2005-03-01), Ausschnitt et al.
patent: 6884984 (2005-04-01), Ye et al.
patent: 2003/0203291 (2003-10-01), Misaka
patent: 2004/0165164 (2004-08-01), Raebiger et al.

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