Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2007-01-30
2007-01-30
Rutledge, D. (Department: 2851)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S069000, C355S071000
Reexamination Certificate
active
10990317
ABSTRACT:
In a maskless lithography apparatus light deflected by a patterning array out of a path towards a substrate is directed onto a detector that detects malfunctions of the patterning array. If the patterning array is of a type which selectively diverts radiation in order to pattern the beam, the detector can use the radiation that is diverted out of the beam. Alternatively, a second beam of radiation, additional to the exposure radiation, can be provided.
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ASML Netherlands B.V.
Rutledge D.
Sterne Kessler Goldstein & Fox PLLC
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