Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2011-04-12

2011-04-12

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000, C355S077000, C096S174000

Reexamination Certificate

active

07924404

ABSTRACT:
A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold.

REFERENCES:
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 7227615 (2007-06-01), Tokita
patent: 2004/0136494 (2004-07-01), Lof et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2005/0094125 (2005-05-01), Arai
patent: 2005/0282405 (2005-12-01), Harpham et al.
patent: 2006/0038968 (2006-02-01), Kemper et al.
patent: 2006/0082746 (2006-04-01), Mertens et al.
patent: 2006/0176456 (2006-08-01), Nagasaka et al.
patent: 1 420 298 (2004-05-01), None
patent: 1 420 300 (2004-05-01), None
patent: 1 420 300 (2005-08-01), None
patent: 1 420 298 (2005-10-01), None
patent: WO 99/49504 (1999-09-01), None

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