Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-08-08

2006-08-08

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S072000, C361S234000

Reexamination Certificate

active

07088431

ABSTRACT:
A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, an electrostatic clamp for clamping the article against the article support by an electrostatic field during projection, and a recessed backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support. According to one aspect of the invention, the recessed backfill gas feed includes a shielding layer for shielding the backfill gas in the recessed backfill gas feed from the electrostatic field.

REFERENCES:
patent: 4384918 (1983-05-01), Abe
patent: 4502094 (1985-02-01), Lewin et al.
patent: 4551192 (1985-11-01), Di Milia et al.
patent: 5350479 (1994-09-01), Collins et al.
patent: 5522131 (1996-06-01), Steger
patent: 5539179 (1996-07-01), Nozawa et al.
patent: 5745331 (1998-04-01), Shamouilian et al.
patent: 5777838 (1998-07-01), Tamagawa et al.
patent: 6023405 (2000-02-01), Shamouilian et al.
patent: 6033478 (2000-03-01), Kholodenko
patent: 6608745 (2003-08-01), Tsuruta et al.
patent: 6628503 (2003-09-01), Sogard
patent: 6710857 (2004-03-01), Kondo
patent: 2005/0041364 (2005-02-01), Kellerman et al.
patent: 0947884 (1999-06-01), None
patent: 02002231799 (2002-08-01), None
patent: 02002270618 (2002-09-01), None

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